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silicon tetrafluoride sif4
- Product No.:2020727212552
Commodity |
Silicon Tetrafluoride |
Cas No. |
7783-61-1 |
Molecular formula |
SiF4 |
Purity |
99.0% |
Cylinder capacity |
40L, 47L |
Silicon tetrafluoride,SiF4, is mainly used as etching agent, P-type dopant and epitaxial deposition diffusion silicon source for silicon nitride and tantalum silicide in electronics and semiconductor industry. It can also be used to prepare electronic grade silane or silicon. Silicon tetrafluoride can also be used as a raw material of high purity quartz glass for optical fiber. It is hydrolyzed in a high temperature flame to produce heat-sink silica with a high specific surface area.In addition, silicon tetrafluoride is widely used in the preparation of solar cells, fluorosilicic acid and fluoride pot, chemical analysis, fluoride agents. Oil well drilling, magnesium alloy casting, catalyst, steaming agent, cement and artificial marble hardening and so on. After the use of silicon tetrafluoride in precast cement, the silicon tetrafluoride can improve its corrosion resistance and wear resistance and further improve porosity and increase compression strength.
As one of the important raw materials in the electronics industry, high-purity electron-grade silicon tetrafluoride (SiF4), with a high fluorosilicon ratio, is widely used in the production of optical fiber, semiconductor or solar cell, and is the foundation of the core manufacturing industry in the electronics industry. It can effectively etch silicon nitride, tantalum silicide and other chip materials as P-dopant and epitaxial deposition diffusion silicon source. Especially in the processing technology of high-aspect-width ratio and large-capacity metal interlayer insulating medium in the new generation of chip manufacturing process, silicon tetrafluoride, as a silicon source, can achieve higher chemical deposition rate and produce superior low dielectric constant SiO2 thin films. In addition, silicon tetrafluoride is also the main raw material of optical fiber manufacturing process and the key component of silicon-based semiconductor ion implantation process in optical fiber industry.
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